ASML Holding N.V. (ASML) Earnings Call Transcript & Summary

February 11, 2020

Euronext Amsterdam NL Information Technology Semiconductors and Semiconductor Equipment conference_presentation 32 min

Earnings Call Speaker Segments

Alexander Duval

analyst
#1

Perfect. Well, welcome, everyone. I'm Alex Duval, tech analyst for Europe. I'm delighted to be here with CEO of ASML, Peter Wennink. Thanks very much, everyone, for joining. We're going to start off with some Q&A from me, and then we're going to open it up to the floor for further questions. So maybe I can kick it off with EUV. Sounds a logical play to start, and in particular, 2021.

P. Wennink

executive
#2

Yes.

Alexander Duval

analyst
#3

You talked about the new sort of range of tools, and you're thinking about that. And can you talk a bit about what sort of underpins that from a demand perspective? And what's giving you the confidence to talk about that range of tools for 2021?

P. Wennink

executive
#4

Yes, I think, 2021 is, we'll see a continuation of what we see in 2020. We have to -- most important, if you think about EUV and the future, you have to really go back to 2018 where we turned a corner on EUV. And the relevance of it was that it created a level of confidence for most of our customers, I think, all of our customers in the logic space to say EUV is real. And it effectively meant that our customers and their customers started to think of a road map that would extend into the next decade using EUV, yes? It will be the driver of high-power compute, which would drive all the things where we're currently thinking of, AI, high-power compute, 5G, artificial intelligence. That, I think, was a really important moment in time. So that meant customers started to look at their road map. And if we really look at their road map, they shrink road map, the node to node road map. Over the last 2 years, it actually has, I would say, if anything, it has accelerated. So it means that 2020 and 2021 is just a reflection of that road map and so is logic. And it's going to be industry 7, the first 5-nanometer output in that time frame. And that will, of course, when you have high-power compute, you need to think that the derivative of high-power compute is the memory space. You need the high-power computing, the high performance memory. It also meant that the memory makers and the DRAM makers, in particular, were going to look at EUV as a way to extend the road map. And that's happening as we speak. So 2021, it's going to see memory and logic. 2020, primarily logic, but we'll see in the second half of the year. The first, you could see -- you could say that the pilot production -- or no, it's not pilot production. It's the learning of using EUV in 1z DRAM, but it's really the reflection of EUV becoming mature and actually driving the industry way into the next decade on the shrink road maps.

Alexander Duval

analyst
#5

Makes total sense. You touched on memory there. What's the key delta that's really made people put those orders? We've seen news flow around Samsung and so forth. What sort of change in the last year on that front for you to get those significant orders in the door on that?

P. Wennink

executive
#6

Yes, I think, when we -- a few years back when we started to think about EUV and DRAM, it was a bit of a question mark whether we would ever see EUV in memory and in DRAM, particularly. I think what the productivity level because DRAM is very much about cost. So the first way we looked at it was we need to provide industry with a machine that has enough productivity so we can reduce the cost per die. I think when we look at the productivity road map, I think there's a good reason why DRAM customers are now interested at using EUV, but it's all we got. I think what we've found out in the discussion with our customers, it's not only the productivity and the cost. It's really the performance of a device -- a DRAM device using EUV basically because it replaces multiple patterning layers. And we use multiple masks to do one layer. It created a better yield, better performing die, the distribution of high-performing die across the wafer is better. It'll effectively yield. What we're now seeing is that customer are saying, well, while in the current node, they're really agnostic. When it comes to using DPV or EUV, they don't care. It's these elements, yield, it's potentially cost that would drive them to choose for one or the other. But if you look at 1a, for instance, we now have some clear indications that we think customers are designing their DRAM just specifically for use with EUV, which actually means that we believe that the leading customers in the space field has a competitive advantage in using EUV because of the specific design features that it will create for the next-generation DRAM. And that's what we will see. We will see going forward in 2021. We'll definitely see a ramp, one-off are coming. I think we see 1z preliminary production for a limited number of wafers by the second half of this year. So it's also -- it will all come.

Alexander Duval

analyst
#7

Very clear. So the demand is clearly there. When you think about this 45 to 50 units, so I think you've talked about the ability to supply and that being really the kind of main determining factor as we look out to 2021. Can you talk a bit about your level of confidence there? And what are the things that need to happen within ASML but also at suppliers? And how that's progressing?

P. Wennink

executive
#8

Yes. The -- I think we said it also on the call. I mean, in terms of square footage manufacturing space, we're not expanding anything. So how do you get more machines out? It's reducing the cycle time. And the cycle time reduction is a learning curve. So basically, it's -- if you can think about this machine, a highly complex machine, when we did the first of this series, our focus was on getting out a machine that worked. So you could say in our procedures to build that tool, you're building up safety upon safety just to make sure that you can get a tool out there that actually works. Now when you start reproducing that tool in certain volume, you're starting to take the procedures out and you're starting to -- you use your R&D power to actually consolidate procedures and to basically learn to do things faster. That's what it is. I think we're looking at the cycle time reduction in our factory. So next -- by the end of the year, early next year or anywhere between 14 weeks -- 14 to 16 weeks, we're now at around 20, coming down from 26. We used to -- we're out of 18 at the end of last year, but we have a new modular vessel, which is the big vessel in which we create the EUV plasma, which is a new module. It's a big module that stepped up the cycle time with 2 weeks. It will go down. I think by the end of the year, early next year, we'll be at that 14-week period, so roughly a quarter. That will be sufficient for the 40 to 45 units. Now the question is, can we do the same thing in the supply chain? Now ZEISS has always mentioned, there's a big bottleneck. I think ZEISS will be there, yes? But there are other ones like up to 10 critical suppliers that need to ramp up their production capability. We have our own people there that actually help our suppliers to make sure that their cycle time reduction plan get executed. So where are we out today? I think we'll get there, 45 to 50 units. We've taken all the measures. I think our learning curves in die home and in our factory will get us certainly there, and we put a lot of effort in making sure that our supplies can fall.

Alexander Duval

analyst
#9

That's very clear. So clear progression in terms of that learning curve. I guess, another progression we've seen on EUV is the average selling prices as you deliver more value. Obviously, we're on the 3400C now. That's been a very important tool. But as we move forward in the next year or 2, how should we think about that evolving? And to what degree can ASP continue to progress going forward?

P. Wennink

executive
#10

Yes, as you've seen, the progression of ASP from this B version to the C version was about a 35% increase in productivity, about a 30% increase in price. So there's a direct relationship between the productivity, the output and the price, which is also true for DPV. It's not new for EUV. It's also -- we've done that for DPV. And we need to provide our customers with that value. And if we do, then we feel we're entitled to part of that game. That's the same thing. So next year, we'll come out with a D version that will not be 35% higher product. It will probably be something like 10% to 15%, but that's, again, in that area, you will see the price increase. And it's not only the productivity, it also has better lithographic performance. So overlay, which is very critical, if you shrink the minimum feature size of the chip, the overlay, that's the positioning accuracy of the subsequent layers of these structures on top of each other, of course, also becomes more critical. So overlay, in EUV and in DPV is a very important value driver for customers because it is a -- it has a direct correlation to yields. So these things all drive value, we need to prove it, yes, that value is there. I think we can charge it.

Alexander Duval

analyst
#11

Very clear. We've talked about the progression of selling prices on EUV. Can you also talk a bit about gross margins because that's obviously an important value driver in the next year or 2? Obviously, prices will feed into that, but maybe some of the other key features that will be feeding into that.

P. Wennink

executive
#12

Yes. I think when you look at gross margins, it will be -- let's start this year. I mean, this year, we guided 46% to 47% in Q1. Of course, in our Capital Markets Day 2018, we had a target of 50% this year. That was under the assumption that both memory and logic were in a moderate market scenario. In -- I think in memory, we're not in a moderate market scenario. We're in a down cycle scenario. So that means that for the first half of this year, the mix will be different. The second half of the year, we would expect the memory market to rebound. And the memory market is still very much DPV, which is our bread and butter product, with a better margin profile. It's more mature. So it also means that throughout this year, we think towards the second half of the year, you will see the margin reaching that 50% level because we do believe that the memory market will come back in the second half. That's one. Secondly, we also are introducing new tool types in the second half where on the DPV tool type, it's a 2050. Specifically, a little bit higher productivity, but more importantly, overlay is very important. It's a better price. So that's a better margin mix. And third, and absolutely not least, is EUV service. In all of our EUV service, we've built an EUV service infrastructure over the last couple of years, with virtually no income because they were in warranty. And to actually train an EUV engineer to be able to work on its own, it takes about 2 years. So we hired all those people 2 years ago. And basically, we're getting now the first wafer output. And as you know, we're getting pay per wafer. That means that when we start seeing the wafer output because of the first high-volume manufacturing happens as we speak, you will also see that for the first time, we will see EUV service revenue coming in, which by -- in the second half of the year, we will start to be profitable on the EUV service, which we never were until today or until that time. We always were loss-making because hardly any revenue and a big infrastructure. So it's the mix in DPV, driven by the memory return, introduction of new tool types and the EUV service revenue, we will start seeing -- bringing us to 50% margin in the second half of the year.

Alexander Duval

analyst
#13

Talked about, obviously, the memory recovery in the second half. What are the data points that underpin your confidence on that? What are you seeing at the moment that we should be aware of?

P. Wennink

executive
#14

Well, when we think about the memory recovery, this memory downturn is a bit different than we saw before in previous downturns. In previous downturns, when the market was in maybe the state of overcapacity, what memory customers did as they were producing basically a commodity-type product, they were ramping their output as much as they could because the more wafer is out, the more bits out to lower the cost per bit and lower the cost per chip. And it was a race to the bottom, the ones that hit the lowest cost per bit first, they were still making a little bit of a catch money and they're gaining market share. That has not happened this time. This time what we saw is that across the board, memory makers started to turn tools off. So basically creating some idle capacity, whereby managing the capacity output meant that you try to manage the supply-demand situation. It's a bit more proactive, which actually means that we can follow -- for the industry, we can follow the output out of our tools because some tools were switched off and we can see that. So we saw actually a reduction of that output in 2019, bottoming out in Q4 of last year. Then we saw the return of that utilization. Now if you follow that slope and you extrapolate that slope and absent any macroeconomic disasters, if you can follow the slope, you'd see, in Q2, we'll probably hit this equilibrium, a little bit faster for 3D NAND than for DRAM. But then around that time frame, you should also see the effect of pricing because once you still have underutilization, pricing doesn't necessarily move. And that also means that if you follow that trend, then this equilibrium will be reached probably middle of the year or somewhere in Q2, then you need to add capacity in the second half of the year. And that gives us, I guess, it's not a confidence, but it gives us the indication that we're on the right track. And we're preparing for it. Lots of people ask the question, look, how are you going to ship? You have a order lead time and are you going to only ship in 2021? No, because we see this. So we are taking some risk, some supply chain risk, you could say. So if order plunges and based on a certain assumption of bit growth in the -- throughout this year, we can guess, well, how much capacity we would need to add for the remainder of the year, those lenses we ordered, so we have them. That means we can hopefully deliver pretty fast when those orders come in.

Alexander Duval

analyst
#15

Very clear. And if we think a bit sort of longer term, again, about EUV, obviously you've got those orders. Ecosystem is going to scale up. How do you think about the broader EUV ecosystem and the progress there? To what degree do you see any bottlenecks for any of the future nodes that we should be aware of? And then if we think...

P. Wennink

executive
#16

It is assuming.

Alexander Duval

analyst
#17

And even in the broader ecosystem.

P. Wennink

executive
#18

In the broader ecosystem, okay.

Alexander Duval

analyst
#19

And then secondly, if we look even further out, how important is High-NA to your customers' long-term road maps? And philosophically, should we think of that as more an evolution or a revolution in terms of what you need to do?

P. Wennink

executive
#20

Yes. Yes, I think from an ecosystem point of view, everything is there to start using EUV in high-volume manufacturing, I have no doubt there. What it does to the ecosystem is the fact that we have a exposure tool that has all the high-volume manufacturing characteristics. Means that everything else in the ecosystem is now following that trend. So it is real. And what you then see is that the suppliers of the elements of that ecosystem are now stepping up their own R&D, and you see an acceleration. You also see collaboration between partners in that ecosystem that come up with new innovations. So the fact that you have an exposure tool that creates this road map for another 10, 20 -- 10, 15, perhaps 20 years, creates this impetus for innovation in that system. And that's happening as we speak. On the High-NA, High-NA is -- was the most relevant event and also last year is that we actually got EUR 1.5 billion worth of orders for High-NA customers. And actually seeing that EUV works, it means that their road map has now extendibility, but extendibility where we need the next-generation EUV to be ready on time. So they gave us 4 pre-production orders and some -- sorry, some R&D orders and an 8 options on pre-production tools, which -- with High-NA when we meet certain milestones, those options will turn into orders. So it's a commitment of EUR 1.5 billion. And it's an extension. It's a logical extension to Low-NA to 0.33, there's a 0.55. Now where are we? The biggest change and is more evolutionary, although from an optics point of view, it's more revolution because those mirrors actually, EUV mirrors actually have to scale up a factor of 3, and they will be measured in picometers in thousands of a nanometer set atomic. So it's -- and it's big, big mirrors. That was a -- that's a big technological challenge. Now what happened at the end of last year in December? We were able to measure those first big mirror. So we were able to measure it with a specific measurement machine. That's actually was a measurement factory. It's a couple of hundred million euros. But we're able to get the first measurement results, we can measure them. And we met the milestone, which actually triggered a prepayment from the customers. That's very important because it actually means we can start manufacturing those High-NA EUV mirrors into this optical system that will be put into this big machine called the High-NA machine. We'll ship that machine 2022, '23. That's our 4 R&D machines. '23-'24, we will ship the preproduction tools. And then '25, we'll go into HVM, which actually means that our customers have an extendable road map using EUV, which will bring them way into the next decade. So it's evolution, but from an optical point of view, I think it's more like a revolution. I mean, it's so complex that you can hardly talk about because evolution sounds simple. Trust me, this is not simple.

Alexander Duval

analyst
#21

That's very clear. I guess my next question is less technological. One of the things we've seen in the press is this discussion about your ability to sell into China on the EUV side. I wondered if you can sort of put that into context. To what degree and in what ways might that will be significant or not? How should we think about that?

P. Wennink

executive
#22

Yes. I think EUV is on the restricted technology list of the so-called bilateral Wassenaar agreement, which means that the Dutch government needs to opine on this export license request, which it will do. And given the sensitivities and it's also very clear, it's also in the press, that has a lot of sensitivities in any shipment to China and especially from leading-edge technology. So they will take their time. And I think that's what they're doing now. So they haven't issued a license and we're answering a lot of their questions that they have. So we'll see. How important is it? Well, it's 1, 2. If we can ship EUV to China, China still will be able to import chips, then those chips will be made somewhere else with EUV. And then they will be made in either Taiwan or Korea or the United States or whatever. So we will ship our machines and we'll make those chips anyhow. So in that sense, it doesn't have a major impact on ASML.

Alexander Duval

analyst
#23

Very clear. And maybe just finally for me before opening it up for audience questions, I'd like to touch on HMI. Obviously, a very interesting asset. Clearly, the idea here is to develop something very differentiated by integrating with your software capabilities, but also to scale the number of beams and so forth. Can you update a bit on sort of where you are in that journey and how that's progressing right now?

P. Wennink

executive
#24

Yes. I think it's an important element of our strategy. I mean, we call this holistic lithography, which effectively means that we provide the industry with lithography tools, with patterning tools. But those machines have the unique capability to -- because of the thousands of knobs that are in those machines to make intra-die, intra-chip corrections. But you need to know what kind of corrections. So we've developed also metrology tools and the inspection tool, HMI inspection tool is importing in that sense because, in that process, you would like to have certain control points in which you control or you measure what is supposed to be patent is actually patent. Now you feed that back into the scanner through a computational lithography loop. And then, basically, you can then correct. So it's a feedback in a feedforward but -- that's why it's an important building block of our strategy. However, if you think about wafer inspection, sub-10-nanometer, the current optical solutions run into there -- into a brick wall. I mean, it goes down from 10 to 7 to 5 to 3, you can't see it. So you need -- you can see it with electron beam, but that is inherently slow. We currently have wafer inspection tool with 1 beam. So why don't you can then have multiple beams, let's say 9 or 25 or even over 100, you can do it 9x faster, 25x faster or 100x faster, which is all about the cost. So it's very important to have this multi-beam solution, which combines, by the way, with fast-moving stages. The wafer sits on a stage and the wafer inspection takes, actually plays. But when you have more beams, you want to move it faster, you need to have a fast-moving stage. What happens to be that, ASML is very good in making flat moving stages. And HMI very good in creating this multi-beam column. Now we intended to do this with a partner. When we acquired HMI, ran into all kinds of co-owned IP issues, so we had to basically do it ourselves, which led to a delay of, I would say, 9 to 12 months. Now we're shipping the first multi-beam tool, the pilot tool this quarter. We'll ship a few this year, which actually means that the feedbacks that we will get from the customer base will have to create the basis for the first high-volume tool, which we're going to ship next year. And the important element here is that it's not just a stand-alone solution, but it's part of what we call holistic lithography, yes? It is part of the combination of the lithography machines, the metrology and inspection tools and the holistic litho capability to do the calculations to make the adjustments.

Alexander Duval

analyst
#25

Great. Wonder if we have any questions from the audience?

P. Wennink

executive
#26

Question over there. The mic is coming.

Alexander Duval

analyst
#27

It's on its way.

Unknown Analyst

analyst
#28

I have a question. You said that your current manufacturing footprint is geared toward reducing your cycle time. So you can produce, let's say, between 40 and 50 EUV machines. As you hit that in term of full capacity, and you say that probably for the logic clients, you're going to have multiple layers, critical layers, maybe on a DRAM or so. In the memory side, you may even have 3 or 5 critical layers. When do you expect in term of timing-wise to need to increase your manufacturing capabilities in Veldhoven?

P. Wennink

executive
#29

Okay. Yes, I think one way to increase the manufacturing capability, well, I always try to explain it this way. Customers ultimately buy machines. But what they are effectively buying is wafer capacity. So we can give more wafer capacity to our customers by reducing their cycle time and getting more machines out of the same footprint, the square meters or the square footage. But on top of that, we have a road map of increasing the productivity of those machines with every new machine type. So we got a 35% increase in productivity from the B to the C; we got from the C to a D, it could be another 15%. And we have another version coming after that with another increase in productivity because we will increase the power, the source power, the EUV source power, which actually gives more life on the wafer, can move the wafer faster. So the way to get wafer capacity to our customers is also the road map that we currently have in increasing the productivity of the tool. That's a real productivity, the wafers per hour. Now next to that is the availability. It's the time that the machine is up and running. And we're absolutely not there at the point where DPV. DPV is close to 98%, with 85% with EUV, so there's still a long way to go, and we'll get there. So we have end productivity improvement role, we have uptime improvements and the cycle time reduction. Now will that be sufficient to, let's say, 50 or over 50 units? I think if you have to go over 60 units, we need to build probably an addition to the factory. Now let's first get to our wafer per day improvement road map. With the cycle time reduction, I think currently for the next few years, it might be enough. Now from a sales point of view, the more productivity, the higher the value, you can see in the result, we'll charge a high price. And we have some time to think about 60 and plus, but don't forget, when we introduced High-NA, High-NA is there to prevent Low-NA double patterning. Now if we would not have High-NA, it would shrink and double patterning. So 2 masks as for 1 layer is pretty well-known in the industry. So it could do double patterning with EUV, then we would need probably more than the 50, 55 units, we have to go over 60. But with High-NA, we will cannibalize those, and we will go to single patterning again. So what we're doing now is trying to get the wafer capacity add to the things that I just mentioned, until we hit High-NA where we can prevent a lot of double patterning, some double patterning EUV will happen, but we can prevent a lot of double patterning, which would basically mean we would need to expand our production capacity. I hope it's clear. There's a question here.

Alexander Duval

analyst
#30

Question there.

Unknown Analyst

analyst
#31

Could you highlight some of the yield concerns, the yield like how much yield will you get on using EUV compared to the quad patterning on the same lithography process?

P. Wennink

executive
#32

Yield, yes, I think the -- we have seen this across the industry with logic and with memory customers that the use of EUV gets better patterning performance, which translates into yield, also the electrical characteristics of the device are better. And we've already seen that in a pretty early stage a couple of years ago when we started with the first R&D tools. We already saw that. So I think it's a known fact that with EUV, we can be -- have a better pattern that creates better performance in terms of the devices, which is logical. If you think about some of the leading-edge logic that is now using 4 or 5 mask sets for 1 layer, which basically have subsequently need to form 1 pattern, with every step, there is a possibility for an aberration or a de factor. It just makes sense. So we see both in logic and in DRAM, we see better yielding devices using EUV.

Alexander Duval

analyst
#33

That's wonderful.

Unknown Analyst

analyst
#34

I was just curious, when you go from 3300C and then to D, like what the implications are for gross margins around the tool itself? Is it just higher ASP fall-through? Or is there other factors?

P. Wennink

executive
#35

Yes. I think, largely, it's the higher -- the higher ASP will be the driver for the higher margins, let's put it this way, yes? And that is also what we explained to our own customers. Now there are -- from the C to the D, there are some improvements in the optics, which needs some extra work, but I think the majority of the margin improvement will be through productivity.

Alexander Duval

analyst
#36

Great. Well, I think, on that positive note. Thank you very much.

P. Wennink

executive
#37

Thank you. Okay. Thanks.

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